Dr. Philip K. Seidel
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 21 March 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Reticles, Contamination, Particles, Manufacturing, Robotics, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics

Proceedings Article | 14 May 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Metrology, Manufacturing, Inspection, Reflectivity, Reflectometry, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Temperature metrology, Defect inspection

Proceedings Article | 3 May 2007
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Reticles, Manufacturing, Inspection, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Standards development, Defect inspection

Proceedings Article | 15 March 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Reticles, Contamination, Particles, Robotics, Inspection, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Standards development

Proceedings Article | 13 March 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Multilayers, Scattering, Signal attenuation, Ultraviolet radiation, Light scattering, Inspection, Reflectivity, Scanning electron microscopy, Photomasks, Extreme ultraviolet

Showing 5 of 8 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top