Dr. Philipp Jaschinsky
at GLOBALFOUNDRIES Dresden Module One LLC & Co KG
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 21 March 2012
Proc. SPIE. 8323, Alternative Lithographic Technologies IV
KEYWORDS: Lithography, Electron beam lithography, Etching, Silicon, Photomasks, Beam shaping, Electron beam direct write lithography, Semiconducting wafers, Optics manufacturing, 193nm lithography

Proceedings Article | 27 May 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Electron beam lithography, Data modeling, Scattering, Calibration, Computer simulations, Scanning electron microscopy, Monte Carlo methods, Photoresist processing, Process modeling, Chemically amplified resists

Proceedings Article | 3 April 2010
Proc. SPIE. 7637, Alternative Lithographic Technologies II
KEYWORDS: Point spread functions, Electron beams, Metrology, Image processing, Printing, Line width roughness, Cadmium sulfide, Line edge roughness, Electron beam direct write lithography, Photoresist processing

Proceedings Article | 27 May 2009
Proc. SPIE. 7470, 25th European Mask and Lithography Conference
KEYWORDS: Wafer-level optics, Electron beam lithography, Reticles, Etching, Metals, Printing, Photomasks, Integrated optics, Electron beam direct write lithography, Semiconducting wafers

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Electrodes, Silicon, Photomasks, Optical alignment, Electron beam direct write lithography, Semiconducting wafers, Prototyping

Showing 5 of 6 publications
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