Dr. Philippe Bandelier
at CEA-LETI
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 7 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Modulation, Interferometers, Image processing, Scanners, Interferometry, Photoresist materials, Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 21 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Diffraction, Polarization, Interferometers, Interferometry, Printing, Photoresist materials, Line width roughness, Line edge roughness, Liquids, Diffraction gratings

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