Dr. Philippe Foubert
R&D Team Leader at imec
SPIE Involvement:
Author
Publications (41)

Proceedings Article | 16 October 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Lithography, Materials processing, Scanning electron microscopy, Printing, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Critical dimension metrology, Stochastic processes, Process engineering

Proceedings Article | 7 October 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Lithography, Scanners, Silicon, Inspection, Bridges, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Stochastic processes

Proceedings Article | 8 April 2019
Proc. SPIE. 10960, Advances in Patterning Materials and Processes XXXVI
KEYWORDS: Switching, Calibration, 3D modeling, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Stochastic processes

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Data modeling, Calibration, Ultraviolet radiation, Scanning electron microscopy, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Modeling and simulation, Stochastic processes

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Scanners, Particles, Coating, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Stochastic processes

Showing 5 of 41 publications
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