Dr. Philippe Michallon
at Commissariat a l'Energie Atomique
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 23 March 2010 Paper
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Lithography, Diffraction, Interferometers, Photons, Interferometry, Near field diffraction, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Diffraction gratings

Proceedings Article | 21 March 2008 Paper
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Lithography, Optical design, Light sources, Interferometers, Collimation, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Synchrotrons, Line edge roughness

Proceedings Article | 21 March 2007 Paper
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Lithography, FT-IR spectroscopy, Ultraviolet radiation, Molecules, Atomic force microscopy, Nanoimprint lithography, Fluorine, Self-assembled monolayers, Natural surfaces, Liquids

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