Dr. Philippe Thony
at Institut National de l'Energie Solaire
SPIE Involvement:
Publications (18)

Proceedings Article | 3 April 2018 Open Access Paper
Laurent Fulbert, Philippe Thony, Marc Rabarot, Jean Marty, Engin Molva
Proceedings Volume 10570, 105702C (2018) https://doi.org/10.1117/12.2326638
KEYWORDS: Semiconductor lasers, Diodes, Lanthanum, Cerium, Laser applications, Modulation, Optical parametric oscillators, Laser energy, Photons, Astronomical imaging

Proceedings Article | 5 November 2005 Paper
Philippe Thony, Béatrice Biasse, Marc Zussy, Giovanni Bianucci, Pietro Cantu', Daniel Henry
Proceedings Volume 5992, 59920X (2005) https://doi.org/10.1117/12.631719
KEYWORDS: Pellicles, Photomasks, Silica, Lithography, Chromium, Monochromatic aberrations, Semiconducting wafers, Databases, Optical lithography, Critical dimension metrology

Proceedings Article | 27 August 2005 Paper
R. Quintanilha, J. Hazart, P. Thony, D. Henry
Proceedings Volume 5858, 58580C (2005) https://doi.org/10.1117/12.612081
KEYWORDS: Critical dimension metrology, Scatterometry, Line edge roughness, Reflectometry, Scatter measurement, Ellipsometry, Scanning electron microscopy, Spectroscopy, Lithography, Edge roughness

Proceedings Article | 12 May 2005 Paper
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.601756
KEYWORDS: Photomasks, Lithography, Monte Carlo methods, Critical dimension metrology, Optical proximity correction, Polarization, Lithographic illumination, Optical lithography, SRAF, Nanoimprint lithography

Proceedings Article | 12 May 2005 Paper
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.601743
KEYWORDS: Chromium, Photomasks, Scattering, Semiconducting wafers, Optical proximity correction, Lithography, Phase shifts, Scanners, Diffraction, Etching

Showing 5 of 18 publications
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