Dr. Philippe Thony Profile

Dr. Philippe Thony

at Institut National de l'Energie Solaire

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Author

Publications (18)

Proceedings Article | 3 April 2018 Open Access

Technologies pour les microlasers et la micro-optique

Laurent Fulbert, Philippe Thony, Marc Rabarot, Jean Marty, Engin Molva

Proceedings Volume 10570, 105702C (2018) https://doi.org/10.1117/12.2326638

KEYWORDS: Semiconductor lasers, Diodes, Lanthanum, Cerium, Laser applications, Modulation, Optical parametric oscillators, Laser energy, Photons, Astronomical imaging

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Proceedings Article | 5 November 2005 Paper

Demonstration of a new mask structure using a bonded hard pellicle

Philippe Thony, Béatrice Biasse, Marc Zussy, Giovanni Bianucci, Pietro Cantu', Daniel Henry

Proceedings Volume 5992, 59920X (2005) https://doi.org/10.1117/12.631719

KEYWORDS: Pellicles, Photomasks, Silica, Lithography, Chromium, Monochromatic aberrations, Semiconducting wafers, Databases, Optical lithography, Critical dimension metrology

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Proceedings Article | 27 August 2005 Paper

Influence of the real-life structures in optical metrology using spectroscopic scatterometry analysis

R. Quintanilha, J. Hazart, P. Thony, D. Henry

Proceedings Volume 5858, 58580C (2005) https://doi.org/10.1117/12.612081

KEYWORDS: Critical dimension metrology, Scatterometry, Line edge roughness, Reflectometry, Scatter measurement, Ellipsometry, Scanning electron microscopy, Spectroscopy, Lithography, Edge roughness

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Proceedings Article | 12 May 2005 Paper

Assessment of complementary double dipole lithography for 45nm and 32nm technologies

Sergei Postnikov, Emilien Robert, Philippe Thony, Kyle Patterson, Scott Warrick, Daniel Henry, Andres Torres, Olivier Toublan

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.601756

KEYWORDS: Photomasks, Lithography, Monte Carlo methods, Critical dimension metrology, Optical proximity correction, Polarization, Lithographic illumination, Optical lithography, SRAF, Nanoimprint lithography

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Proceedings Article | 12 May 2005 Paper

Strategies of optical proximity correction dedicated to chromeless phase lithography for 65 and 45 nm node

Emilien Robert, Philippe Thony, Kevin Lucas, Daniel Henry, Bryan Kasprowicz, Sergei Postnikov, Will Conley, Wei Wu, Lloyd Litt

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.601743

KEYWORDS: Chromium, Photomasks, Scattering, Semiconducting wafers, Optical proximity correction, Lithography, Phase shifts, Scanners, Diffraction, Etching

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Proceedings Article | 10 May 2005 Paper

Overlay measurement accuracy verification using CD-SEM and application to the quantification of WIS caused by BARC

Laurent Lecarpentier, Vincent Vachellerie, Elyakim Kassel, Yosef Avrahamov, Chin-Chou Huang, Frank Felten, Marco Polli, Aurelien Feneyrou, Philippe Thony, Stephane Guillot

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.610662

KEYWORDS: Overlay metrology, Semiconducting wafers, Etching, Reticles, Scanning electron microscopy, Error analysis, Metrology, Detection and tracking algorithms, Scanners, Inspection

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Proceedings Article | 10 May 2005 Paper

Application of spectroscopic scatterometry method in hole matrices analysis

R. Quintanilha, J. Hazart, P. Thony, D. Henry

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.599373

KEYWORDS: Scatterometry, Matrices, Critical dimension metrology, Spectroscopy, Scatter measurement, Silicon, Scanning electron microscopy, Dielectrics, Diffraction, Semiconducting wafers

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Proceedings Article | 20 August 2004 Paper

CPL reticle technology for advanced device applications

Willard Conley, Douglas Van Den Broeke, Robert Socha, Wei Wu, Lloyd Litt, Kevin Lucas, Bernard Roman, Richard Peters, Colita Parker, J. Fung Chen, Kurt Wampler, Thomas Laidig, Erika Schaefer, Jan-Pieter Kuijten, Arjan Verhappen, Stephan van de Goor, Martin Chaplin, Bryan Kasprowicz, Christopher Progler, Emilien Robert, Philippe Thony, Michael Hathorn

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557802

KEYWORDS: Photomasks, Optical proximity correction, Image processing, Reticles, Resolution enhancement technologies, Phase shifts, Mask making, Scanning electron microscopy, Quartz, Binary data

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Proceedings Article | 28 May 2004 Paper

The application of CPL reticle technology for the 0.045-mm node

Will Conley, Douglas Van Den Broeke, Robert Socha, Wei Wu, Lloyd Litt, Kevin Lucas, Bernard Roman, Richard Peters, Colita Parker, Fung Chen, Kurt Wampler, Thomas Laidig, Erika Schaefer, Jan-Pieter Kuijten, Arjan Verhappen, Stephan van de Goor, Martin Chaplin, Bryan Kasprowicz, Christopher Progler, Emilien Robert, Philippe Thony

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.537613

KEYWORDS: Photomasks, Optical proximity correction, Reticles, Image processing, Resolution enhancement technologies, Phase shifts, Mask making, Scanning electron microscopy, Manufacturing, Quartz

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Proceedings Article | 24 May 2004 Paper

3D features analysis using spectroscopic scatterometry

Richard Quintanilha, Philippe Thony, Daniel Henry, Jerome Hazart

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.537192

KEYWORDS: Scatterometry, Scatter measurement, Spectroscopy, Ellipsometry, Matrices, Semiconducting wafers, Critical dimension metrology, Optical metrology, Software development, Silicon

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Proceedings Article | 15 July 2003 Paper

Spectroscopic ellipsometric scatterometry: sources of errors in critical dimension control

Jerome Hazart, Gilles Grand, Philippe Thony, David Herisson, Stephanie Garcia, Oliver Lartigue

Proceedings Volume 5041, (2003) https://doi.org/10.1117/12.485218

KEYWORDS: Scatterometry, Critical dimension metrology, Refractive index, Spectroscopy, Silicon, Ultraviolet radiation, Laser induced breakdown spectroscopy, Error analysis, Thin films, Modeling

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Proceedings Article | 2 June 2003 Paper

Spectroscopic ellipsometry for lithography front-end level CD control: a complete analysis for production integration

David Herisson, DaniEle Neira, Cyril Fernand, Philippe Thony, Daniel Henry, Stephanie Kremer, Marco Polli, Marco Guevremont, Assim Elazami

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.485031

KEYWORDS: Single crystal X-ray diffraction, Critical dimension metrology, Lithography, Scanning electron microscopy, Scatterometry, Metrology, Spectroscopic ellipsometry, Electron microscopes, Process control, Semiconducting wafers

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Proceedings Article | 2 June 2003 Paper

First review of a suitable metrology framework for the 65-nm technology node

Ermes Severgnini, Mauro Vasconi, David Herisson, Philippe Thony

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.482645

KEYWORDS: Metrology, Line edge roughness, Scatterometry, Scanning electron microscopy, Semiconducting wafers, Reticles, Silicon, Coating, Critical dimension metrology, Edge roughness

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Proceedings Article | 28 May 1999 Paper

Laser radar using a 1.55-um passively Q-switched microchip laser

Philippe Thony, Laurent Fulbert, Pascal Besesty, Bernard Ferrand

Proceedings Volume 3707, (1999) https://doi.org/10.1117/12.351391

KEYWORDS: Pulsed laser operation, Q switched lasers, Semiconductor lasers, Semiconducting wafers, Absorption, Visibility, Visibility through fog, Fiber optic gyroscopes, Laser applications, Electronics

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Proceedings Article | 10 March 1999 Paper

Optical microsystems with microchip lasers and micro-optics

Laurent Fulbert, Engin Molva, Jeannine Marty, Philippe Thony, Marc Rabarot, Bernard Ferrand

Proceedings Volume 3680, (1999) https://doi.org/10.1117/12.341257

KEYWORDS: Semiconductor lasers, Etching, Microlens, Semiconducting wafers, Nd:YAG lasers, Fiber lasers, Laser applications, Mirrors, Silica, Micro optics

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Proceedings Article | 8 December 1997 Paper

Fiber-coupled microchip lasers for the LMJ

Laurent Fulbert, Philippe Kramer, Marc Rabarot, Philippe Thony, Engin Molva

Proceedings Volume 3047, (1997) https://doi.org/10.1117/12.294293

KEYWORDS: Neodymium lasers, Fiber lasers, Pulsed laser operation, Microlens, Semiconductor lasers, Mirrors, Single mode fibers, Semiconducting wafers, Pulse generators, Fiber coupled lasers

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Proceedings Article | 11 April 1996 Paper

Tm:Y2SiO5 and Tm:SrY4(SiO4)3O microchip lasers

Philippe Thony, Corinne Borel, Roselyne Templier

Proceedings Volume 2772, (1996) https://doi.org/10.1117/12.238116

KEYWORDS: Crystals, Semiconductor lasers, Laser crystals, Absorption, Thulium, Laser damage threshold, Diodes, Polarization, Mirrors, Sapphire lasers

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Proceedings Article | 17 April 1995 Paper

Growth by liquid phase epitaxy and low-threshold laser oscillation at 2.012 um of a Tm:YAG waveguide laser

Corinne Borel, Armelle Rameix, Philippe Thony, Bernard Ferrand, David Shepherd, Alan Large, Toby Warburton, Anne Tropper, David Hanna

Proceedings Volume 2380, (1995) https://doi.org/10.1117/12.206948

KEYWORDS: Waveguides, Liquid phase epitaxy, Mirrors, Crystals, Laser damage threshold, Waveguide lasers, Refractive index, Gallium, Diodes, Nd:YAG lasers

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Showing 5 of 18 publications

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