Dr. Philippe Thony
at Institut National de l'Energie Solaire
SPIE Involvement:
Author
Publications (18)

Proceedings Article | 3 April 2018
Proc. SPIE. 10570, International Conference on Space Optics — ICSO 1997
KEYWORDS: Optical parametric oscillators, Modulation, Laser energy, Photons, Laser applications, Semiconductor lasers, Diodes, Astronomical imaging, Lanthanum, Cerium

Proceedings Article | 5 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Monochromatic aberrations, Optical lithography, Silica, Databases, Chromium, Pellicles, Photomasks, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 27 August 2005
Proc. SPIE. 5858, Nano- and Micro-Metrology
KEYWORDS: Ellipsometry, Lithography, Spectroscopy, Scanning electron microscopy, Scatterometry, Reflectometry, Critical dimension metrology, Line edge roughness, Scatter measurement, Edge roughness

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Diffraction, Scattering, Etching, Scanners, Chromium, Photomasks, Optical proximity correction, Semiconducting wafers, Phase shifts

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Polarization, Monte Carlo methods, Photomasks, Optical proximity correction, SRAF, Nanoimprint lithography, Critical dimension metrology

Proceedings Article | 10 May 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Reticles, Metrology, Detection and tracking algorithms, Etching, Scanners, Error analysis, Inspection, Scanning electron microscopy, Semiconducting wafers, Overlay metrology

Showing 5 of 18 publications
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