Phillip Lim
at KLA Corp
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 22 January 2018
Proc. SPIE. 10451, Photomask Technology 2017
KEYWORDS: Reticles, Defect detection, Data modeling, Databases, Particles, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 28 June 2013
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Reticles, Defect detection, Data modeling, Databases, Particles, Inspection, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, EUV optics

Proceedings Article | 20 March 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Reticles, Optical lithography, Defect detection, Inspection, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Line edge roughness, Semiconducting wafers, Defect inspection

Proceedings Article | 11 May 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Reticles, Logic, Detection and tracking algorithms, Imaging systems, Sensors, Databases, Inspection, Photomasks, SRAF, Critical dimension metrology

Proceedings Article | 24 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Signal to noise ratio, Reticles, Logic, Detection and tracking algorithms, Imaging systems, Sensors, Inspection, SRAF, Prototyping, Digital breast tomosynthesis

Showing 5 of 10 publications
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