Dr. Phillip L. Reu Profile

Dr. Phillip L. Reu

Senior Member of Technical Staff at Sandia National Labs

SPIE Involvement:

Author

Proceedings Article | 13 September 2012 Paper

Digital holography reconstruction algorithms to estimate the morphology and depth of nonspherical absorbing particles

Daniel Guildenbecher, Jian Gao, Phillip Reu, Jun Chen

Proceedings Volume 8493, 849303 (2012) https://doi.org/10.1117/12.928869

KEYWORDS: Particles, Holograms, Digital holography, Spherical lenses, Charge-coupled devices, Optical simulations, Opacity, Reconstruction algorithms, Computer simulations, Detection and tracking algorithms

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SPIE Journal Paper | 1 July 2008

Optical temporal frequency low-pass filtering and heterodyning with a microchannel plate

Phillip Reu, Bruce Hansche

OE, Vol. 47, Issue 07, 074001, (July 2008) https://doi.org/10.1117/12.10.1117/1.2957050

KEYWORDS: Microchannel plates, Optical filters, Heterodyning, Linear filtering, Photodiodes, Electronic filtering, Modulation, Cameras, Spectrum analysis, Optical engineering

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Proceedings Article | 6 January 2006 Paper

Experimental apparatus and software design for dynamic long-term reliability testing of a spring-mass MEMS device

Phillip Reu, Danelle Tanner, David Epp, Ted Parson, Brad Boyce

Proceedings Volume 6111, 61110J (2006) https://doi.org/10.1117/12.648488

KEYWORDS: Laser Doppler velocimetry, Microelectromechanical systems, Humidity, Reliability, Control systems, Microscopes, Mirrors, Imaging systems, Interference (communication), Silicon

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Proceedings Article | 16 June 2003 Paper

EUV mask stress mapping by an experimental and hybrid finite element technique

Zhaohua Feng, Edward Lovell, Roxann Engelstad, Andrew Mikkelson, Phillip Reu, Jaewoong Sohn, Kenneth Blaedel, Andre Claudet

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.490139

KEYWORDS: Photomasks, Extreme ultraviolet, Multilayers, Reticles, Reflectors, Lithography, Distortion, Extreme ultraviolet lithography, Chromium, Spherical lenses

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Proceedings Article | 16 June 2003 Paper

Reduction of image placement errors in EPL masks

Obert Wood, Phillip Reu, Roxann Engelstad, Edward Lovell, Michael Lercel, Carey Thiel, Mark Lawliss, R. Mackay

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.490136

KEYWORDS: Photomasks, Reticles, Silicon, Semiconducting wafers, Mask making, Metrology, Electron beam lithography, Optical alignment, Projection lithography, Lithography

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Proceedings Article | 28 May 2003 Paper

Ultrathin-membrane EPL masks

J. Greschner, T. Bayer, S. Kalt, H. Weiss, Phillip Reu, Roxann Engelstad, Obert Wood, Carey Thiel, Michael Gordon, Rajinder Dhaliwal, Christopher Robinson, Hans Pfeiffer

Proceedings Volume 5148, (2003) https://doi.org/10.1117/12.515090

KEYWORDS: Photomasks, Silicon, Manufacturing, Lithography, Silicon carbide, Carbon, Scanning electron microscopy, Photomicroscopy, Mechanics, Microelectronics

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SPIE Journal Paper | 1 April 2003

Predicting overlay performance for electron projection lithography masks

Phillip Reu, Cheng-Fu Chen, Roxann Engelstad, Edward Lovell, Michael Lercel, Obert Wood, R. Mackay

JM3, Vol. 2, Issue 02, (April 2003) https://doi.org/10.1117/12.10.1117/1.1563646

KEYWORDS: Photomasks, Mask making, Manufacturing, Electron beam lithography, Performance modeling, Projection lithography, Finite element methods, 3D modeling, Device simulation, Semiconducting wafers

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Proceedings Article | 27 December 2002 Paper

Experimental and numerical studies of the response of photomask hard pellicles to acoustic excitation

Eric Cotte, Phillip Reu, Roxann Engelstad, Edward Lovell, Andrew Grenville, Chris Van Peski

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468606

KEYWORDS: Pellicles, Reticles, Acoustics, Modal analysis, Lithography, Photomasks, Adhesives, Silica, Glasses, Computing systems

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Proceedings Article | 1 July 2002 Paper

Predicting overlay performance for electron projection lithography masks

Phillip Reu, Cheng-Fu Chen, Roxann Engelstad, Edward Lovell, Michael Lercel, Obert Wood, R. Mackay

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472280

KEYWORDS: Photomasks, Mask making, Electron beam lithography, Projection lithography, Manufacturing, Semiconducting wafers, Silicon, Etching, Control systems, Finite element methods

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Proceedings Article | 14 September 2001 Paper

Mechanical analysis of hard pellicles for 157-nm lithography

Phillip Reu, Andrew Mikkelson, Michael Schlax, Eric Cotte, Lowell Siewert, Roxann Engelstad, Edward Lovell, Giang Dao, Jun-Fei Zheng

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435651

KEYWORDS: Pellicles, Reticles, Lithography, Aluminum, Velocity measurements, Finite element methods, Silica, Optical components, Adhesives, Modal analysis

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Proceedings Article | 14 September 2001 Paper

Experimental model verification of the thermal response of optical reticles

Amr Abdo, Phillip Reu, Michael Schlax, Roxann Engelstad, William Beckman, John Mitchell, Edward Lovell

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435687

KEYWORDS: Reticles, Thermography, Calibration, Thermal modeling, Light sources, Copper, Optical lithography, Platinum, 3D modeling, Optical components

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Proceedings Article | 20 August 2001 Paper

Evaluation and comparison of the pattern-transfer-induced image placement distortions on e-beam projection lithography masks

Christopher Magg, Michael Lercel, Mark Lawliss, Robin Ackel, Neal Caldwell, Louis Kindt, Kenneth Racette, Carey Williams, Phillip Reu

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436664

KEYWORDS: Photomasks, Image processing, Electron beam lithography, Projection lithography, Silicon, Scattering, Etching, Lithography, Finite element methods, Image analysis

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Proceedings Article | 21 July 2000 Paper

Predicting pattern transfer distortions during EUV mask fabrication

Phillip Reu, Richard Tejeda, Roxann Engelstad, Edward Lovell, Avijit Ray-Chaudhuri

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390034

KEYWORDS: Photomasks, Extreme ultraviolet, Multilayers, Photoresist processing, Mask making, Lithography, 3D modeling, Oxides, Silicon, Etching

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Showing 5 of 13 publications

Conference Committee Involvement (2)

Interferometry XVI: Applications

14 August 2012 | San Diego, California, United States

Interferometry XV: Applications

3 August 2010 | San Diego, California, United States

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