Dr. Pierre-Jerome Goirand
at STMicroelectronics
SPIE Involvement:
Publications (13)

Proceedings Article | 10 April 2013 Paper
Maxime Gatefait, Bertrand Le-Gratiet, Pierre Jerome Goirand, Auguste Lam, Richard Van Haren, Anne Pastol, Maya Doytcheva, Xing Lan Liu, Jan Beltman
Proceedings Volume 8681, 868105 (2013) https://doi.org/10.1117/12.2011099
KEYWORDS: Semiconducting wafers, Overlay metrology, Reticles, Etching, Contamination, Metrology, Scanners, Lithography, Data modeling, Distortion

Proceedings Article | 10 April 2013 Paper
B. Orlando, N. Spaziani, N. Socquet, R. Bouyssou, M. Gatefait, P.J. Goirand
Proceedings Volume 8681, 868118 (2013) https://doi.org/10.1117/12.2011122
KEYWORDS: 3D modeling, Scatterometry, Optical lithography, Critical dimension metrology, Scatter measurement, Lithography, Semiconducting wafers, Process control, Silicon, Silicon carbide

Proceedings Article | 10 April 2013 Paper
Proceedings Volume 8681, 868117 (2013) https://doi.org/10.1117/12.2011117
KEYWORDS: Lithography, Overlay metrology, 193nm lithography, Semiconducting wafers, Double patterning technology, Optical alignment, Optical lithography, Scanners, Remote sensing, Control systems

Proceedings Article | 7 March 2008 Paper
Proceedings Volume 6924, 69244M (2008) https://doi.org/10.1117/12.775708
KEYWORDS: Oxides, Critical dimension metrology, Metrology, Chemical mechanical planarization, Logic, Semiconducting wafers, Etching, Optical lithography, Lithography, Scanners

Proceedings Article | 2 April 2007 Paper
Proceedings Volume 6520, 65201L (2007) https://doi.org/10.1117/12.714341
KEYWORDS: Polarization, Refractive index, Photoresist materials, Water, Imaging devices, Lithography, Photomasks, Semiconductors, Photoresist developing, Manufacturing

Showing 5 of 13 publications
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