Dr. Pierre-Jerome Goirand
at STMicroelectronics
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 10 April 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Lithography, Optical lithography, Silicon, 3D modeling, Scatterometry, Process control, Silicon carbide, Critical dimension metrology, Semiconducting wafers, Scatter measurement

Proceedings Article | 10 April 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Lithography, Optical lithography, Scanners, Remote sensing, Control systems, Double patterning technology, Optical alignment, Semiconducting wafers, Overlay metrology, 193nm lithography

Proceedings Article | 10 April 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Lithography, Reticles, Metrology, Contamination, Data modeling, Etching, Scanners, Distortion, Semiconducting wafers, Overlay metrology

Proceedings Article | 7 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Oxides, Lithography, Metrology, Logic, Optical lithography, Etching, Scanners, Critical dimension metrology, Semiconducting wafers, Chemical mechanical planarization

Proceedings Article | 2 April 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Semiconductors, Lithography, Refractive index, Polarization, Water, Manufacturing, Imaging devices, Photoresist materials, Photomasks, Photoresist developing

Showing 5 of 13 publications
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