Pierre-Yves Guittet
Sales Support at Nanda-Technologies GmbH
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | April 2, 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Metrology, Logic, Optical lithography, Etching, Image processing, Inspection, Process control, Critical dimension metrology, Neodymium, Semiconducting wafers

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Etching, Dielectrics, Electrons, Silicon, Scanning electron microscopy, Process control, Photomasks, Cadmium sulfide, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | May 24, 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Mid-IR, Metrology, Reflection, Silicon, 3D modeling, Scanning electron microscopy, Infrared spectroscopy, Spectroscopic ellipsometry, Infrared radiation, Semiconducting wafers

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