Dr. Pierre M. Fanton
at STMicroelectronics
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 28 April 2023 Poster + Paper
Proceedings Volume 12494, 1249412 (2023) https://doi.org/10.1117/12.2657686
KEYWORDS: Scanners, Light sources and illumination, Semiconducting wafers, Contour extraction, Image filtering, Lithography, Automation, Scanning electron microscopy

Proceedings Article | 28 March 2017 Paper
Proceedings Volume 10145, 101450X (2017) https://doi.org/10.1117/12.2260024
KEYWORDS: Semiconducting wafers, Metrology, Optical lithography, Electron beam lithography, Scanners, Finite element methods, Scanning electron microscopy, Lithography, Inspection, Computational lithography

Proceedings Article | 28 March 2017 Paper
Proceedings Volume 10145, 1014514 (2017) https://doi.org/10.1117/12.2257876
KEYWORDS: Etching, Metrology, Lithography, Scanning electron microscopy, Inspection, Process control, Manufacturing, Process engineering, Chemical mechanical planarization, Copper, Semiconducting wafers, Metals, Image processing, Optical alignment

Proceedings Article | 24 March 2016 Paper
P. Fanton, J. C. Le Denmat, C. Gardiola, A. Pelletier, F. Foussadier, C. Gardin, J. Planchot, A. Szucs, O. Ndiaye, N. Martin, L. Depre, F. Robert
Proceedings Volume 9778, 97781U (2016) https://doi.org/10.1117/12.2218916
KEYWORDS: 3D modeling, Optical proximity correction, Metals, 3D metrology, Optical lithography, Evolutionary algorithms, Photomasks, Scanning electron microscopy, Critical dimension metrology, Image processing, Etching, Calibration, Artificial intelligence, Reliability

Proceedings Article | 8 March 2016 Paper
Proceedings Volume 9778, 97782O (2016) https://doi.org/10.1117/12.2220295
KEYWORDS: Semiconducting wafers, Process control, Metals, Photomasks, Data processing, Defect detection, 3D modeling, Image processing, Lithography, Computational lithography, Scanners, Finite element methods, Optical lithography, Etching, Metrology, Scanning electron microscopy

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