Pierre L. Leroux
at Maxim Integrated Products Inc
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 16 July 2002
Proc. SPIE. 4689, Metrology, Inspection, and Process Control for Microlithography XVI
KEYWORDS: Lithography, Reticles, Diffractive optical elements, Data modeling, Calibration, Silicon, Distortion, Optical alignment, Semiconducting wafers, Overlay metrology

SPIE Journal Paper | 1 July 2000
OE Vol. 39 Issue 07
KEYWORDS: Scanning electron microscopy, Optical testing, Metrology, Solids, Optical metrology, Diffraction, Diffraction gratings, Wafer-level optics, Optical alignment, Reflectivity

Proceedings Article | 14 June 1999
Proc. SPIE. 3677, Metrology, Inspection, and Process Control for Microlithography XIII
KEYWORDS: Wafer-level optics, Metrology, Error analysis, Optical testing, Scanning electron microscopy, Image quality, Solids, Photomasks, Optical alignment, Semiconducting wafers

Proceedings Article | 7 July 1997
Proc. SPIE. 3050, Metrology, Inspection, and Process Control for Microlithography XI
KEYWORDS: Wafer-level optics, Eye, Metrology, Visualization, Matrices, Error analysis, Photomasks, Optical alignment, Semiconducting wafers, Standards development

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