Dr. Pierre Sixt
Lithography Coordinator at MINATEC
SPIE Involvement:
Publications (13)

Proceedings Article | 14 March 2023 Poster + Paper
Proceedings Volume 12443, 124430I (2023) https://doi.org/10.1117/12.2649947
KEYWORDS: Retroreflectors, Retroreflector prisms, Augmented reality, Automotive front vision, Heads up displays, Diffusers, Deep reactive ion etching, Projection systems

SPIE Journal Paper | 8 October 2014
Thomas Kämpfe, Pierre Sixt, Denis Renaud, Armelle Lagrange, Fabrice Perrin, Olivier Parriaux
OE, Vol. 53, Issue 10, 107105, (October 2014) https://doi.org/10.1117/12.10.1117/1.OE.53.10.107105
KEYWORDS: Polarization, Silicon, Microelectronics, Semiconducting wafers, Photomasks, Transformers, Prototyping, Manufacturing, Chemical elements, Amorphous silicon

Proceedings Article | 2 May 2014 Paper
T. Kaempfe, P. Sixt, D. Renaud, A. Lagrange, F. Perrin, O. Parriaux
Proceedings Volume 9130, 91300W (2014) https://doi.org/10.1117/12.2052156
KEYWORDS: Polarization, Silicon, Photomasks, Semiconducting wafers, Microelectronics, Transformers, Amorphous silicon, Prototyping, Chromium, Manufacturing

Proceedings Article | 21 June 2006 Paper
Michael Cangemi, Vicky Philipsen, Rudi De Ruyter, Leonardus Leunissen, Nicolo Morgana, Pierre Sixt, Marc Cangemi, Rand Cottle, Bryan Kasprowicz
Proceedings Volume 6281, 62810T (2006) https://doi.org/10.1117/12.692803
KEYWORDS: Etching, Quartz, Photomasks, Semiconducting wafers, Polarization, Manufacturing, Chromium, Reticles, Lithography, Phase shifts

Proceedings Article | 15 March 2006 Paper
Proceedings Volume 6154, 615413 (2006) https://doi.org/10.1117/12.659238
KEYWORDS: Photomasks, Critical dimension metrology, Optical proximity correction, Semiconducting wafers, Lithography, Chromium, Polarization, Image processing, SRAF, Resolution enhancement technologies

Showing 5 of 13 publications
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