Dr. Pierre Sixt
Lithography Coordinator at MINATEC
SPIE Involvement:
Author
Publications (12)

SPIE Journal Paper | 8 October 2014
OE Vol. 53 Issue 10
KEYWORDS: Polarization, Silicon, Microelectronics, Semiconducting wafers, Photomasks, Transformers, Prototyping, Manufacturing, Chemical elements, Amorphous silicon

Proceedings Article | 2 May 2014
Proc. SPIE. 9130, Micro-Optics 2014
KEYWORDS: Amorphous silicon, Transformers, Polarization, Silicon, Manufacturing, Chromium, Microelectronics, Photomasks, Semiconducting wafers, Prototyping

Proceedings Article | 21 June 2006
Proc. SPIE. 6281, 22nd European Mask and Lithography Conference
KEYWORDS: Lithography, Reticles, Polarization, Etching, Quartz, Manufacturing, Chromium, Photomasks, Semiconducting wafers, Phase shifts

Proceedings Article | 15 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Polarization, Image processing, Chromium, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 9 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Reticles, Silica, Scattering, Etching, Manufacturing, Chromium, Photomasks, Wet etching, Resolution enhancement technologies

Proceedings Article | 5 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Optical lithography, Etching, Quartz, Manufacturing, Chromium, Electroluminescence, Printing, Photomasks, Optical proximity correction, Phase shifts

Showing 5 of 12 publications
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