Dr. Pieter Brandt
at MAPPER Lithography
SPIE Involvement:
Author
Publications (12)

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Electron beam lithography, Electron beams, Line width roughness, Optical alignment, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | April 27, 2017
Proc. SPIE. 10144, Emerging Patterning Technologies
KEYWORDS: Wafer-level optics, Lithography, Electron beam lithography, Electron beams, Switching, Lithographic illumination, Photomasks, Integrated optics, Optical alignment, Semiconducting wafers

PROCEEDINGS ARTICLE | March 22, 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Etching, Silicon, Scanning electron microscopy, Line width roughness, Neodymium, Semiconducting wafers, Surface conduction electron emitter displays

PROCEEDINGS ARTICLE | March 22, 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Lithography, Electron beam lithography, Point spread functions, Metrology, Logic, Optical lithography, Data modeling, Calibration, Manufacturing, Electroluminescence, Software development, Optical simulations, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Electronic design automation

SPIE Journal Paper | August 12, 2015
JM3 Vol. 14 Issue 03
KEYWORDS: Electron beam direct write lithography, Photovoltaics, Lithium, Immersion lithography, Electron beam lithography, Lithography, Electronic design automation, Field programmable gate arrays, Metals, Optical proximity correction

SPIE Journal Paper | July 2, 2015
JM3 Vol. 14 Issue 03
KEYWORDS: Electron beam lithography, Monte Carlo methods, Electroluminescence, Metals, Nano opto mechanical systems, Lithography, Error analysis, Semiconducting wafers, Critical dimension metrology, Overlay metrology

Showing 5 of 12 publications
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