Dr. Pieter Brandt
at MAPPER Lithography
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 16 August 2019
Proc. SPIE. 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
KEYWORDS: Wafer-level optics, Lithography, Electron beam lithography, Electron beams, Switching, Maskless lithography, Optical alignment, Critical dimension metrology, Semiconducting wafers, Standards development

Proceedings Article | 19 September 2018
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Lithography, Electron beams, Silicon, Scanning electron microscopy, Optical scanning, Line width roughness, Optical alignment, Semiconducting wafers, Prototyping, Overlay metrology

Proceedings Article | 19 March 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Electron beam lithography, Electron beams, Line width roughness, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 27 April 2017
Proc. SPIE. 10144, Emerging Patterning Technologies
KEYWORDS: Wafer-level optics, Lithography, Electron beam lithography, Electron beams, Switching, Lithographic illumination, Photomasks, Integrated optics, Optical alignment, Semiconducting wafers

Proceedings Article | 22 March 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Etching, Silicon, Scanning electron microscopy, Line width roughness, Neodymium, Semiconducting wafers, Surface conduction electron emitter displays

Showing 5 of 14 publications
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