Dr. Pieter Vanelderen
at imec
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 22 February 2021 Presentation
Fabian Holzmeier, Stefan Böttcher, Kevin Dorney, Esben Larsen, Thomas Nuytten, Dhirendra Singh, Michiel van Setten, Pieter Vanelderen, Clayton Bargsten, Seth Cousin, Daisy Raymondson, Eric Rinard, Rod Ward, Henry Kapteyn, Oleksiy Dyachenko, Raimund Kremzow, Marko Wietstruk, Geoffrey Pourtois, Paul van der Heide, John Petersen
Proceedings Volume 11610, 1161010 (2021) https://doi.org/10.1117/12.2595038
KEYWORDS: Lithography, Extreme ultraviolet lithography, Ultrafast phenomena, Photoemission spectroscopy, Coherence imaging, Semiconducting wafers, Radiometry, Extreme ultraviolet, Time resolved spectroscopy, Spectroscopy

Proceedings Article | 5 May 2020 Paper
Shu Hao Chang, Brian Cardineau, Stephen Meyers, Saika Muntaha Bari, Masahiko Harumoto, Harold Stokes, Moeen Ghafoor, Jason Stowers, Michael Kocsis, Pieter Vanelderen
Proceedings Volume 11323, 1132322 (2020) https://doi.org/10.1117/12.2552918
KEYWORDS: Extreme ultraviolet, Photoresist materials, Scanning electron microscopy, Metals, Photoresist processing, Semiconducting wafers, Extreme ultraviolet lithography, Line width roughness, Manufacturing, System on a chip

Proceedings Article | 23 March 2020 Presentation + Paper
Proceedings Volume 11326, 1132615 (2020) https://doi.org/10.1117/12.2551684
KEYWORDS: Photoresist materials, Extreme ultraviolet lithography, Lithography, Stochastic processes, Line width roughness, Extreme ultraviolet, Optical lithography, Photoresist developing

Proceedings Article | 26 March 2019 Presentation + Paper
Victor Blanco, Ming Mao, Yoann Tomczak, David de Roest, Nicola Kissoon, Gijsbert Rispens, Guido Schiffelers, Abhinav Pathak, Frederic Lazzarino, Danilo De Simone, Paulina Rincon Delgadillo, Pieter Vanelderen, Etienne de Poortere, Moyra Mc Manus, Daniele Piumi, Eric Hendrickx, Geert Vandenberghe
Proceedings Volume 10957, 109570S (2019) https://doi.org/10.1117/12.2515503
KEYWORDS: Etching, Lithography, Extreme ultraviolet lithography, Photoresist materials, Logic, Optical lithography

Proceedings Article | 26 March 2019 Presentation + Paper
Murat Pak, Davide Crotti, Farrukh Yasin, Monique Ercken, Sandip Halder, Danilo De Simone, Pieter Vanelderen, Laurent Souriau, Hubert Hody, Gouri Sankar Kar
Proceedings Volume 10957, 109570R (2019) https://doi.org/10.1117/12.2515023
KEYWORDS: Etching, Optical lithography, Semiconducting wafers, Critical dimension metrology, Resistance, Magnetism, Photoresist processing, Manufacturing, Printing, Extreme ultraviolet lithography

Showing 5 of 10 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top