Dr. Pieter Vanelderen
at imec
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 22 February 2021 Presentation
Proc. SPIE. 11610, Novel Patterning Technologies 2021
KEYWORDS: Ultrafast phenomena, Lithography, Coherence imaging, Spectroscopy, Extreme ultraviolet, Extreme ultraviolet lithography, Photoemission spectroscopy, Time resolved spectroscopy, Radiometry, Semiconducting wafers

Proceedings Article | 5 May 2020 Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Metals, Manufacturing, Scanning electron microscopy, Photoresist materials, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers, System on a chip

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11326, Advances in Patterning Materials and Processes XXXVII
KEYWORDS: Lithography, Optical lithography, Photoresist materials, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Stochastic processes, Photoresist developing

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Optical lithography, Etching, Image processing, Image analysis, Scanning electron microscopy, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Failure analysis

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Lithography, Logic, Optical lithography, Etching, Photoresist materials, Extreme ultraviolet lithography

Showing 5 of 10 publications
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