Dr. Pieter Woltgens
at ASML Netherlands BV
SPIE Involvement:
Publications (5)

Proceedings Article | 9 April 2024 Presentation + Paper
Proceedings Volume 12956, 129560I (2024) https://doi.org/10.1117/12.3011818
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Optical lithography, Photons, Electrons, 2D materials, Field effect transistors, Direct write lithography, Advanced patterning

Proceedings Article | 26 May 2022 Paper
Proceedings Volume 12051, 120510I (2022) https://doi.org/10.1117/12.2614260
KEYWORDS: SRAF, Logic, Semiconducting wafers, Lithography, Photomasks, Optical proximity correction, Critical dimension metrology, Printing, Extreme ultraviolet lithography, Statistical analysis

Proceedings Article | 30 October 2020 Presentation + Paper
Proceedings Volume 11517, 1151713 (2020) https://doi.org/10.1117/12.2573155
KEYWORDS: Reticles, Semiconducting wafers, Photomasks, Imaging systems, Extreme ultraviolet, Optical proximity correction, Image resolution

Proceedings Article | 2 April 2020 Presentation + Paper
Proceedings Volume 11323, 113231L (2020) https://doi.org/10.1117/12.2552888
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Logic, Optical lithography, Photomasks, Resolution enhancement technologies, Source mask optimization, Optical proximity correction, Metals, Nanoimprint lithography

Proceedings Article | 4 September 2015 Paper
Gerald Dicker, Diederik de Bruin, Brennan Peterson, Pieter Wöltgens, Boudewijn Sluijk, Peter Jenkins
Proceedings Volume 9661, 96610F (2015) https://doi.org/10.1117/12.2195622
KEYWORDS: Extreme ultraviolet, Manufacturing, Logic, Metals, Extreme ultraviolet lithography, Logic devices, Optical lithography, Semiconducting wafers, Photomasks, Lithography

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