Prof. Pietro Cantu
Lithography, OPC, Metrology manager at STMicroelectronics SRL
SPIE Involvement:
Publications (12)

Proceedings Article | 23 March 2020 Paper
Proceedings Volume 11326, 1132622 (2020)
KEYWORDS: System on a chip, Semiconducting wafers, Coating, Polymers, Liquids, Lithography, Scanning electron microscopy, Photoresist materials

Proceedings Article | 20 March 2019 Paper
Proceedings Volume 10962, 1096213 (2019)
KEYWORDS: Semiconducting wafers, Coating, Polymers, Scanning electron microscopy, Photomasks, Silicon, Lithography, Optical microscopy

Proceedings Article | 20 March 2018 Paper
Pietro Cantù, Chiara Catarisano, Nicoletta Corneo, Alessandro Dundulachi, Emma Litterio, Valeria Mantovani, Matteo Patelmo, Benedetta Triulzi
Proceedings Volume 10588, 105880S (2018)
KEYWORDS: Critical dimension metrology, Metals, Data modeling, Neural networks, Photoresist materials, Convolution, Artificial neural networks, Machine learning, Optical lithography, Evolutionary algorithms

Proceedings Article | 4 March 2010 Paper
Pietro Cantu, Livio Baldi, Paolo Piacentini, Joost Sytsma, Bertrand Le Gratiet, Stéphanie Gaugiran, Patrick Wong, Hiroyuki Miyashita, Luisa Atzei, Xavier Buch, Dick Verkleij, Olivier Toublan, Francesco Perez-Murano, David Mecerreyes
Proceedings Volume 7640, 764022 (2010)
KEYWORDS: Double patterning technology, Photomasks, Lithography, Metrology, Etching, Optical lithography, Algorithm development, Immersion lithography, Materials processing, Manufacturing

Proceedings Article | 1 April 2008 Paper
Manuel Tagliavini, Elisabetta Annoni, Pietro Cantù, Gianfranco Capetti, Chiara Catarisano, Roberto Colombo, Giovanni Magri, Marcello Ravasio, Federica Zanderigo
Proceedings Volume 6924, 69243Y (2008)
KEYWORDS: Critical dimension metrology, Photomasks, Etching, Optical lithography, Optical proximity correction, Semiconducting wafers, Lithography, Model-based design, Reticles, Metrology

Showing 5 of 12 publications
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