Extreme ultraviolet lithography (EUVL) requires an emission of soft
x-rays around a wavelength region of 13.5 nm.
EHYBRID simulation was made under the laser operation at 1064 nm with a pulse duration of 6 ns. Intensity was
changed between 1 x 10 12 W/cm2 and 5 x 10 12 W/cm2. Soft X-rays emitted from Sn XII and Sn XIII ions were
simulated by using the EHYBRID code. Ion fractions of the tin ions and the line intensities for different electron
temperatures were calculated by using the collisional radiative code NeF.
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