Dr. Ping Qu
Senior Process Engineer at Intel Corp
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 29 May 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Multilayers, Metrology, Etching, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Mask making, Defect inspection

Proceedings Article | 15 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Reticles, Logic, Optical lithography, Etching, Quartz, Manufacturing, Photomasks, Optical proximity correction, Critical dimension metrology, Phase shifts

Proceedings Article | 28 June 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Electron beam lithography, Optical lithography, Deep ultraviolet, Quartz, Chromium, Spatial light modulators, Photomasks, Optical alignment, Critical dimension metrology, Neodymium

Proceedings Article | 6 December 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Optical lithography, Etching, Coating, Inspection, Reflectivity, Chromium, Scanning electron microscopy, Photomasks, Extreme ultraviolet lithography, Ruthenium

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