Dr. Piyush Verma Profile

Dr. Piyush Verma

at GLOBALFOUNDRIES Inc

SPIE Involvement:

Author

Publications (10)

Proceedings Article | 20 March 2019 Paper

Multilayer CMP hotspot modeling through deep learning

Luis Francisco, Rui Mao, Ushasree Katakamsetty, Piyush Verma, Robert Pack

Proceedings Volume 10962, 109620U (2019) https://doi.org/10.1117/12.2514467

KEYWORDS: Data modeling, Chemical mechanical planarization, Statistical modeling, Performance modeling, Feature extraction, Lithography, Metals, Machine learning, Calibration, Design for manufacturing

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Proceedings Article | 30 March 2017 Paper

Design space analysis of novel interconnect constructs for 22nm FDX technology

Tuhin Guha Neogi, Navneet Jain, Piyush Verma, David Permana, Andrey Lutich, Francois Weishbuch, Deepal Wehella-Gamage, Benoit Francois Claude Ramadout, Gowtham Vangara, Juhan Kim, Thomas Herrmann, Kai Sun, Katherina Babich, David Pritchard, Mahbub Rashed

Proceedings Volume 10148, 101480Z (2017) https://doi.org/10.1117/12.2258668

KEYWORDS: Monte Carlo methods, Diffusion, Statistical analysis, Lithography, Manufacturing, Diffractive optical elements, Optical lithography, Design for manufacturability, Silicon, Shape analysis

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Proceedings Article | 4 September 2015 Paper

Optimization of rule-based OPC fragmentation to improve wafer image rippling

Jingyu Wang, Alexander Wei, Piyush Verma, William Wilkinson

Proceedings Volume 9661, 96610D (2015) https://doi.org/10.1117/12.2194755

KEYWORDS: Optical proximity correction, Photomasks, Semiconducting wafers, Solids, Lithography, Diffraction, Wafer-level optics, Image segmentation, Imaging systems, Signal processing

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Proceedings Article | 18 March 2015 Paper

VLSI physical design analyzer: A profiling and data mining tool

Shikha Somani, Piyush Verma, Sriram Madhavan, Fadi Batarseh, Robert Pack, Luigi Capodieci

Proceedings Volume 9427, 942712 (2015) https://doi.org/10.1117/12.2087078

KEYWORDS: Statistical analysis, Very large scale integration, Profiling, Data modeling, Databases, Metals, Data mining, Data processing, Data storage, Visualization

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Proceedings Article | 18 March 2015 Paper

Hybrid OPC flow with pattern search and replacement

Piyush Verma, Shikha Somani, Yang Ping, Piyush Pathak, Rani Ghaida, Carl Babcock, Fadi Batarseh, Jingyu Wang, Sriram Madhavan, Sarah McGowan

Proceedings Volume 9426, 942611 (2015) https://doi.org/10.1117/12.2087094

KEYWORDS: Optical proximity correction, Photomasks, SRAF, Photovoltaics, Model-based design, Very large scale integration, Optical lithography, Data modeling, Image classification, Library classification systems

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Proceedings Article | 18 March 2015 Paper

A methodology to optimize design pattern context size for higher sensitivity to hotspot detection using pattern association tree (PAT)

Shikha Somani, Piyush Pathak, Piyush Verma, Sriram Madhavan, Luigi Capodieci

Proceedings Volume 9427, 94270T (2015) https://doi.org/10.1117/12.2086954

KEYWORDS: Acquisition tracking and pointing, Image classification, Very large scale integration, Semiconducting wafers, Defect detection, Metals, Bridges, Computer simulations, Wafer-level optics, Optics manufacturing

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Proceedings Article | 8 October 2014 Paper

Pattern-based pre-OPC operation to improve model-based OPC runtime

Piyush Verma, Fadi Batarseh, Shikha Somani, Jingyu Wang, Sarah McGowan, Sriram Madhavan

Proceedings Volume 9235, 923506 (2014) https://doi.org/10.1117/12.2068998

KEYWORDS: Optical proximity correction, Photomasks, Very large scale integration, Model-based design, Logic, Lithography, Image classification, Library classification systems, Computer simulations, Optics manufacturing

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Proceedings Article | 8 October 2014 Paper

Conducting OPC retargeting as guided by principles of classical dynamics

Jingyu Wang, Piyush Verma, Alexander Wei, William Wilkinson

Proceedings Volume 9235, 923507 (2014) https://doi.org/10.1117/12.2067814

KEYWORDS: Optical proximity correction, Semiconducting wafers, Photomasks, Visualization, Lithography, Metals, Calibration, Solids, Patents, Shape analysis

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Proceedings Article | 8 October 2014 Paper

Model-based virtual VSB mask writer verification for efficient mask error checking and optimization prior to MDP

Robert Pack, Keith Standiford, Todd Lukanc, Guo Xiang Ning, Piyush Verma, Fadi Batarseh, Gek Soon Chua, Akira Fujimura, Linyong Pang

Proceedings Volume 9235, 923509 (2014) https://doi.org/10.1117/12.2069613

KEYWORDS: Photomasks, Optical proximity correction, Lithography, Vestigial sideband modulation, Semiconducting wafers, Data modeling, Model-based design, Error analysis, Manufacturing, Critical dimension metrology

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Proceedings Article | 8 October 2014 Paper

Efficient full-chip QA Tool for design to mask (D2M) feature variability verification

Fadi Batarseh, Piyush Verma, Robert Pack, Shikha Somani

Proceedings Volume 9235, 92351Y (2014) https://doi.org/10.1117/12.2069346

KEYWORDS: Profiling, Photomasks, Optical proximity correction, Image classification, Critical dimension metrology, Product engineering, Neodymium, Structural design, Ions, Library classification systems

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Showing 5 of 10 publications

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