Dr. Piyush Verma
at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (9)

PROCEEDINGS ARTICLE | March 30, 2017
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Lithography, Optical lithography, Statistical analysis, Diffractive optical elements, Silicon, Diffusion, Manufacturing, Monte Carlo methods, Shape analysis, Design for manufacturability

PROCEEDINGS ARTICLE | September 4, 2015
Proc. SPIE. 9661, 31st European Mask and Lithography Conference
KEYWORDS: Wafer-level optics, Lithography, Diffraction, Imaging systems, Image segmentation, Signal processing, Solids, Photomasks, Optical proximity correction, Semiconducting wafers

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Data mining, Statistical analysis, Data modeling, Visualization, Data storage, Databases, Metals, Data processing, Profiling, Very large scale integration

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Photovoltaics, Optical lithography, Data modeling, Very large scale integration, Photomasks, Image classification, Optical proximity correction, SRAF, Model-based design, Library classification systems

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Wafer-level optics, Defect detection, Metals, Computer simulations, Bridges, Very large scale integration, Image classification, Acquisition tracking and pointing, Semiconducting wafers, Optics manufacturing

PROCEEDINGS ARTICLE | October 8, 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Lithography, Patents, Visualization, Calibration, Metals, Solids, Photomasks, Shape analysis, Optical proximity correction, Semiconducting wafers

Showing 5 of 9 publications
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