Dr. Po-Shin Lee
Director Sales Div at Gudeng Precision Industrial Co Ltd
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 24 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Reticles, Air contamination, Semiconducting wafers, Pellicles, Sensors, Contamination, Manufacturing, Photomasks, Scanners, Oscilloscopes

Proceedings Article | 4 December 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Reticles, Air contamination, Electromagnetic coupling, Semiconducting wafers, Sensors, Manufacturing, Oscilloscopes, 193nm lithography, Photomasks, Scanners

Proceedings Article | 19 May 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Pellicles, Reticles, Air contamination, Oxygen, Photomasks, Contamination, Nitrogen, Diffusion, Computer simulations, Lithography

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