Mr. Pradiptya Ghosh
Director of Engg - RET, MDP and Platform at Mentor Graphics Corp
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Author
Publications (8)

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Lithography, Photomasks, Double patterning technology, Optical proximity correction, SRAF, Photomask technology, Current controlled current source

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Detection and tracking algorithms, Data modeling, Computing systems, Control systems, Computer simulations, Data processing, Photomasks, Optical proximity correction, SRAF, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Optical lithography, Extreme ultraviolet, Double patterning technology, Optical proximity correction, Manufacturing equipment, Current controlled current source

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Visualization, Metals, Image processing, Manufacturing, Photomasks, Double patterning technology, Optical proximity correction, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | December 12, 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Lithography, Optical lithography, Roads, Visualization, Manufacturing, Photomasks, Acquisition tracking and pointing, Double patterning technology, New and emerging technologies, Design for manufacturability

PROCEEDINGS ARTICLE | September 23, 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Metrology, Manufacturing, Inspection, Computer simulations, Data processing, Photomasks, Data conversion, Semiconducting wafers, Standards development, Vestigial sideband modulation

Showing 5 of 8 publications
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