Pradiptya Ghosh
Director of Engg - RET, MDP and Platform at Mentor, a Siemens Business
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 8 November 2012 Paper
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Optical proximity correction, Double patterning technology, Photomask technology, Current controlled current source, Lithography, Photomasks, SRAF

Proceedings Article | 13 March 2012 Paper
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Data processing, Computer simulations, Optical proximity correction, Data modeling, Resolution enhancement technologies, SRAF, Photomasks, Control systems, Detection and tracking algorithms, Computing systems

Proceedings Article | 13 March 2012 Paper
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Optical lithography, Extreme ultraviolet, Current controlled current source, Double patterning technology, Optical proximity correction, Manufacturing equipment

Proceedings Article | 14 October 2011 Paper
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Double patterning technology, Photomasks, Optical proximity correction, Manufacturing, Metals, Resolution enhancement technologies, Visualization, Semiconducting wafers, Image processing, Lithography

Proceedings Article | 12 December 2009 Paper
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Photomasks, Visualization, Double patterning technology, Lithography, Design for manufacturability, Manufacturing, Acquisition tracking and pointing, Roads, Optical lithography

Showing 5 of 8 publications
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