Dr. Prasad Dasari
Principal Scientist
SPIE Involvement:
Author
Publications (23)

Proceedings Article | 24 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Transmission electron microscopy, Metrology, Optical lithography, Scatterometry, Reactive ion etching, Etching, Semiconducting wafers, Diffractive optical elements, Critical dimension metrology, Scatter measurement

Proceedings Article | 24 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Metrology, Thin films, X-rays, X-ray optics, Semiconducting wafers, Wafer-level optics, Process control, Ellipsometry, Diffractive optical elements, Deposition processes, Optical testing, Dielectrics, Optical properties

Proceedings Article | 19 March 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Copper, Chemical mechanical planarization, Scatterometry, Metrology, Semiconducting wafers, Resistance, Reactive ion etching, Etching, 3D modeling, Back end of line

Proceedings Article | 10 April 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Critical dimension metrology, Scatterometry, Extreme ultraviolet lithography, Extreme ultraviolet, Semiconducting wafers, Metrology, Scanners, 3D modeling, Scanning electron microscopy, Ellipsometry

Proceedings Article | 10 April 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Semiconducting wafers, Scatterometry, Metrology, Extreme ultraviolet, Critical dimension metrology, Extreme ultraviolet lithography, 3D metrology, Neodymium, Spectroscopic ellipsometry, Lithography

Showing 5 of 23 publications
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