Prasad S. Kelkar
at Univ of Sherbrook
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Electron beam lithography, Electron beams, Silicon, Resistance, Chromium, Monte Carlo methods, Silicon films, Transistors, Plasma etching, Line edge roughness

PROCEEDINGS ARTICLE | May 6, 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Photomasks, Line width roughness, Line edge roughness, Semiconducting wafers, Tolerancing, Systems modeling, Standards development

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Etching, Silicon, Coating, Semiconductor lasers, Photomasks, Zone plates, Semiconducting wafers

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