Dr. Prashant K. Kulshreshtha
Post-Doctoral Fellow at Lawrence Berkeley National Lab
SPIE Involvement:
Author
Area of Expertise:
E-beam Lithography , Pattern Design , Resist Characterization , EUV Patterning/Lithogrpahy , Nanoscale Mechanical Property , Silicon device fabrication and characterization
Profile Summary

Prashant K Kulshreshtha is Postdoctoral Fellow for Nanoscale property measurement at Molecular Foundry, LBNL. He is currently working with Dr. Deirdre Olynick (Scientist) and Dr. Paul Ashby (Scientist) on a Intel Corp. funded Molecules for Advanced Patterning (MAP) Project to understand and mitigate the pattern collapse in sub-20 nm lithography. He received his Ph.D. in Material Science and Engineering from the North Carolina State University, Raleigh in December 2011. His research interests include developing new scanning probe tools and methods to characterize the mechanical and surface properties of high resolution resist systems.
Publications (3)

PROCEEDINGS ARTICLE | March 20, 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Calibration, Chemistry, Atomic force microscopy, Scanning electron microscopy, Scanning probe microscopy, Line edge roughness, Line scan image sensors

PROCEEDINGS ARTICLE | April 18, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Calibration, Ions, Silicon, Chemistry, Atomic force microscopy, Scanning electron microscopy, Transmission electron microscopy, Extreme ultraviolet lithography, Scanning probe microscopy, Neodymium

PROCEEDINGS ARTICLE | March 29, 2013
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Lithography, Electron beam lithography, Image processing, Molecules, Image resolution, Scanning electron microscopy, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Chemically amplified resists

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