Prashant K Kulshreshtha is Postdoctoral Fellow for Nanoscale property measurement at Molecular Foundry, LBNL. He is currently working with Dr. Deirdre Olynick (Scientist) and Dr. Paul Ashby (Scientist) on a Intel Corp. funded Molecules for Advanced Patterning (MAP) Project to understand and mitigate the pattern collapse in sub-20 nm lithography. He received his Ph.D. in Material Science and Engineering from the North Carolina State University, Raleigh in December 2011. His research interests include developing new scanning probe tools and methods to characterize the mechanical and surface properties of high resolution resist systems.
Revealing beam-induced chemistry using modulus mapping in negative-tone EUV/e-beam resists with and without cross-linker additives