Dr. Qi-De Qian
CTO at IC Scope Research
SPIE Involvement:
Author
Publications (22)

Proceedings Article | 3 May 2004 Paper
Proc. SPIE. 5379, Design and Process Integration for Microelectronic Manufacturing II
KEYWORDS: Image processing, Manufacturing, Design for manufacturing, Photomasks, Compound parabolic concentrators, Transistors, Optical proximity correction, Critical dimension metrology, Standards development, Resolution enhancement technologies

Proceedings Article | 17 December 2003 Paper
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Optical lithography, Data modeling, Manufacturing, Printing, Photomasks, Optical proximity correction, Optimization (mathematics), Semiconducting wafers, Model-based design

Proceedings Article | 28 August 2003 Paper
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Lithography, Optical lithography, Data modeling, Manufacturing, Printing, Photomasks, Optical proximity correction, Semiconducting wafers, Model-based design, Process modeling

Proceedings Article | 10 July 2003 Paper
Proc. SPIE. 5042, Design and Process Integration for Microelectronic Manufacturing
KEYWORDS: Lithography, Data modeling, Image processing, Manufacturing, Photomasks, Optical proximity correction, Photoresist processing, Semiconducting wafers, Systems modeling, Process modeling

Proceedings Article | 27 December 2002 Paper
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Metrology, Digital image processing, Image processing, Denoising, Manufacturing, Feature extraction, Scanning electron microscopy, Digital imaging, Photomasks, Critical dimension metrology

Showing 5 of 22 publications
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