Qi Cheng
Ph.D Student at Univ of Missouri
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 16 March 2016 Paper
Proc. SPIE. 9781, Design-Process-Technology Co-optimization for Manufacturability X
KEYWORDS: Fabrication, Lithography, Optical lithography, Visualization, Manufacturing, Line width roughness, Transistors, TCAD, Yield improvement, Device simulation

Proceedings Article | 18 March 2015 Paper
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Oxides, Metrology, Statistical analysis, Doping, 3D modeling, 3D metrology, Field effect transistors, TCAD, Instrument modeling, Nanowires

Proceedings Article | 18 March 2015 Paper
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Logic, Optical lithography, Statistical analysis, Manufacturing, Line width roughness, Failure analysis, TCAD, Circuit switching, Data analysis

Proceedings Article | 28 March 2014 Paper
Proc. SPIE. 9053, Design-Process-Technology Co-optimization for Manufacturability VIII
KEYWORDS: Oxides, Silicon, Sodium, Line edge roughness, Electronics engineering, Computer engineering, TCAD, Device simulation, Instrument modeling

Proceedings Article | 29 March 2013 Paper
Proc. SPIE. 8684, Design for Manufacturability through Design-Process Integration VII
KEYWORDS: Oxides, Lithography, Interfaces, Doping, Differential equations, Line width roughness, TCAD, Performance modeling, Instrument modeling

Showing 5 of 10 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top