Qi Cheng
Ph.D Student at Univ of Missouri
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 16 March 2016
Proc. SPIE. 9781, Design-Process-Technology Co-optimization for Manufacturability X
KEYWORDS: Optical lithography, Device simulation, TCAD, Fabrication, Manufacturing, Lithography, Yield improvement, Line width roughness, Transistors, Visualization

Proceedings Article | 18 March 2015
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: 3D modeling, Field effect transistors, TCAD, Instrument modeling, Oxides, Doping, Metrology, 3D metrology, Statistical analysis, Nanowires

Proceedings Article | 18 March 2015
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Optical lithography, Failure analysis, Statistical analysis, Line width roughness, TCAD, Circuit switching, Logic, Manufacturing, Data analysis

Proceedings Article | 28 March 2014
Proc. SPIE. 9053, Design-Process-Technology Co-optimization for Manufacturability VIII
KEYWORDS: TCAD, Instrument modeling, Oxides, Line edge roughness, Silicon, Sodium, Electronics engineering, Computer engineering, Device simulation

Proceedings Article | 29 March 2013
Proc. SPIE. 8684, Design for Manufacturability through Design-Process Integration VII
KEYWORDS: TCAD, Oxides, Instrument modeling, Line width roughness, Performance modeling, Lithography, Doping, Interfaces, Differential equations

Showing 5 of 10 publications
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