Dr. Qi Lin
Staff Process Engineer at Xilinx Inc
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | September 16, 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Optical lithography, Silicon, Diffusion, Field programmable gate arrays, Photomasks, Double patterning technology, Optical proximity correction, Optical alignment, Critical dimension metrology, Semiconducting wafers

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