Dr. Qian Zhao
Sr. Product Engineer at ASML San Jose
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | March 22, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Data modeling, Calibration, Image processing, Error analysis, Scanning electron microscopy, Time metrology, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Optical lithography, Calibration, Etching, Plasma etching, Optical proximity correction, Reactive ion etching, Plasma

PROCEEDINGS ARTICLE | March 25, 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Lithography, Cadmium, Data modeling, Calibration, Computer simulations, 3D modeling, Computational lithography, Optical proximity correction, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 23, 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Light sources, Optical lithography, Data modeling, Scanners, Manufacturing, Control systems, Process control, Source mask optimization, Optical proximity correction, Critical dimension metrology, Panoramic photography, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Lithography, Electron beam lithography, Data modeling, Calibration, 3D modeling, Atomic force microscopy, Scanning electron microscopy, Double patterning technology, Data centers, Photoresist processing

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Data modeling, Diffusion, Computer simulations, 3D modeling, Photomasks, Optical proximity correction, Semiconducting wafers, Performance modeling, 3D image processing

Showing 5 of 10 publications
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