Dr. Qiang Wu
Development Staff Engineer at IBM Corp
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 28 May 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Diffraction, Phase shifting, Optical lithography, Image processing, Diffusion, Photomasks, Critical dimension metrology, Photoresist processing, Semiconducting wafers

Proceedings Article | 28 May 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Etching, Metals, Image processing, Silicon, Finite element methods, Photomasks, Critical dimension metrology, Semiconducting wafers, Back end of line

Proceedings Article | 26 June 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Lithography, Diffraction, Phase shifting, Optical lithography, Control systems, Photomasks, Critical dimension metrology, Error control coding, Tolerancing, Phase shifts

Proceedings Article | 16 July 2002
Proc. SPIE. 4689, Metrology, Inspection, and Process Control for Microlithography XVI
KEYWORDS: Thin films, Lithography, Diffraction, Imaging systems, Image segmentation, Light scattering, Signal processing, Photomasks, Optical alignment, Semiconducting wafers

Proceedings Article | 22 August 2001
Proc. SPIE. 4344, Metrology, Inspection, and Process Control for Microlithography XV
KEYWORDS: Semiconductors, Lithography, Scattering, Metals, Image segmentation, Silicon, Light scattering, Computer simulations, Optical alignment, Tolerancing

Proceedings Article | 25 June 1999
Proc. SPIE. 3676, Emerging Lithographic Technologies III
KEYWORDS: Lithography, FT-IR spectroscopy, Luminescence, X-rays, Hydrogen, Nondestructive evaluation, Semiconducting wafers, X-ray lithography, Halogens, Chemically amplified resists

Showing 5 of 7 publications
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