Dr. Qiang Wu
Assistant Director at Semiconductor Manufacturing International Corp
SPIE Involvement:
Author
Publications (14)

SPIE Journal Paper | April 23, 2018
JM3 Vol. 17 Issue 02
KEYWORDS: Semiconducting wafers, Particles, Optical lithography, Nitrogen, Photomasks, Semiconductor manufacturing, Lithium, Lithography, Fluid dynamics, Photoresist materials

SPIE Journal Paper | September 13, 2017
JM3 Vol. 16 Issue 03
KEYWORDS: Source mask optimization, Data modeling, Calibration, Photoresist processing, Semiconducting wafers, Wafer-level optics, Image processing, Electroluminescence, Critical dimension metrology, Diffusion

PROCEEDINGS ARTICLE | March 8, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Semiconductors, Oxides, Lithography, Optical lithography, Etching, Chemical vapor deposition, Photoresist materials, Process control, Integrated circuits, Critical dimension metrology, Stress analysis, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | April 10, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Optical lithography, Image processing, Manufacturing, Photoresist materials, Photomasks, Double patterning technology, Immersion lithography, Semiconducting wafers, Natural surfaces, Photoresist developing

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Semiconductors, Electron beams, Metals, Inspection, Electron microscopes, Control systems, Scanning electron microscopy, Process control, Optical proximity correction, Critical dimension metrology

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Laser sources, Safety, Image processing, Frequency modulation, Photomasks, Fermium, Semiconductor manufacturing, Critical dimension metrology, Chlorine, Semiconducting wafers

Showing 5 of 14 publications
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