Dr. Qiaowei Lou
at TEL Technology Ctr America LLC
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 6 April 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Line edge roughness, Lithography, Etching, Amorphous silicon, Extreme ultraviolet, Oxidation, Extreme ultraviolet lithography, Optical lithography, Scanning electron microscopy, Critical dimension metrology

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