In this paper, some novel micro/nano- moire grating fabricating techniques are introduced. The gratings are produced by the SPM lithography, FIB lithography, and molecular beam epitaxy (MBE) method. The moire patterns formed with these gratings are also introduced. The gratings are successfully to be used to measure the residual deformation in the surface around a step edge of the Al/Si artificial nanocluster with the moire methods. The successful experimental results verify the feasibility of these methods.