Dr. Qiliang Yan
at Synopsys Inc
SPIE Involvement:
Author
Publications (16)

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Reflectors, Reticles, Silicon, Reflectivity, Photomasks, Extreme ultraviolet, Optical proximity correction, Critical dimension metrology, Molybdenum, Semiconducting wafers

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Electron beams, Optical lithography, Data modeling, Scattering, Photons, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, High volume manufacturing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 26, 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Lithography, Lithographic illumination, Calibration, 3D modeling, Optical testing, Photomasks, Source mask optimization, Optical proximity correction, Performance modeling, Process modeling

PROCEEDINGS ARTICLE | September 9, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Lithography, Lithographic illumination, Cadmium, Calibration, Error analysis, 3D modeling, Photomasks, Semiconducting wafers, Process modeling, Light

PROCEEDINGS ARTICLE | September 9, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Lithography, Data modeling, Polarization, Calibration, 3D modeling, Photomasks, Optical proximity correction, Statistical modeling, Performance modeling, 3D image processing

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Optical lithography, Cadmium, Calibration, Scanning electron microscopy, Printing, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Binary data

Showing 5 of 16 publications
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