Dr. Qiliang Yan
at Synopsys Inc
SPIE Involvement:
Publications (17)

Proceedings Article | 23 March 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Lithography, Data modeling, Calibration, Image processing, Monte Carlo methods, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Failure analysis, Stochastic processes

Proceedings Article | 19 March 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Reflectors, Reticles, Silicon, Reflectivity, Photomasks, Extreme ultraviolet, Optical proximity correction, Critical dimension metrology, Molybdenum, Semiconducting wafers

Proceedings Article | 24 March 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Electron beams, Optical lithography, Data modeling, Scattering, Photons, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, High volume manufacturing, Semiconducting wafers

Proceedings Article | 26 March 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Lithography, Lithographic illumination, Calibration, 3D modeling, Optical testing, Photomasks, Source mask optimization, Optical proximity correction, Performance modeling, Process modeling

Proceedings Article | 9 September 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Lithography, Lithographic illumination, Cadmium, Calibration, Error analysis, 3D modeling, Photomasks, Semiconducting wafers, Process modeling, Light

Showing 5 of 17 publications
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