Qingwei Liu
at Semiconductor Manufacturing International Corp
SPIE Involvement:
Author
Publications (30)

Proceedings Article | 24 March 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Lithography, Optical lithography, Visualization, Etching, Metals, Image processing, Manufacturing, Process control, Photomasks, Immersion lithography, Optical proximity correction, Semiconducting wafers

Proceedings Article | 16 March 2016
Proc. SPIE. 9781, Design-Process-Technology Co-optimization for Manufacturability X
KEYWORDS: Databases, Manufacturing, Profiling, Very large scale integration, Image classification, Acquisition tracking and pointing, Optical proximity correction, Structural design, Electronic design automation, New and emerging technologies, Design for manufacturability

Proceedings Article | 15 March 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Optical lithography, Data modeling, Visualization, Metals, Computer programming, Photomasks, Computational lithography, Optical proximity correction, Semiconducting wafers, Model-based design, Resolution enhancement technologies

Proceedings Article | 18 March 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Lithography, Photovoltaics, Optical lithography, Visualization, Photomasks, Source mask optimization, Optical proximity correction, SRAF, Nanoimprint lithography, Resolution enhancement technologies

Proceedings Article | 12 April 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Logic, Calibration, Ions, Laser induced plasma spectroscopy, Photomasks, Source mask optimization, Optical proximity correction, Neodymium, Molybdenum, Resolution enhancement technologies

Showing 5 of 30 publications
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