In this paper, results from the development of LWIR and VLWIR InAs/GaSb type-II infrared photodetector arrays are presented. Dark currents comparable to the HgCdTe benchmark (Rule07) have been observed and the quantum efficiencies of the detectors exceed 30 %. Bias and temperature dependencies of the QE have been studied showing very low turn on bias (~-25mV) and no variation of the peak QE value with temperature. These results show that there are no unintentional barriers in the detector structures and that the diffusion lengths are long enough to provide efficient collection of carriers. Initial results from the extension of the cut-off wavelength from 11 μm to 14 μm are also presented as well as initial results from photodiodes with thicker absorbers to enhance the QE.
We studied the Ga-free InAs/InAsSb type-II superlattice (T2SL) period, thickness and antimony composition, in order to define an optimized structure suitable for detection of the full mid-wavelength infrared domain (MWIR). The SL structures were fabricated by MBE on n-type GaSb substrates and exhibited cut-off wavelengths between 5μm and 5.5μm at 150K. The growth procedure used to achieve strain-balanced structures is reported and first structural and optical results, made of high-resolution Xray diffraction pattern, AFM image scan, photoluminescence (PL) and time resolved photoluminescence measurements (TRPL), are presented and analyzed.
The knowledge of carrier concentration of doped or non-intentionally doped layer structures grown by Molecular Beam Epitaxy (MBE) is crucial to fabricate and manage design of new advanced photodetectors called "barrier structures". This communication reports on capacitance-voltage (C-V) study on MOS structure. Simulation to define specific MOS design, allowing doping layer concentration extraction by measurements, is performed. MOS structures based on InAs/GaSb Longwave infrared (LWIR) superlattice have been fabricated and characterized. Results obtained were analyzed and compared with simulations.