Mr. Rabih Zaouk Profile

Rabih Zaouk

at Univ of California Irvine

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Proceedings Article | 20 May 2004 Paper

Validation of lithography based on the controlled movement of light-emitting particles

Benjamin Park, Rabih Zaouk, Marc Madou

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.534355

KEYWORDS: Particles, Electrodes, Dielectrophoresis, Lithography, Carbon, Photoresist materials, Liquids, Nanolithography, Atmospheric particles, Particle systems

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A novel particle-based lithography is proposed. In this approach a particle moving in a liquid in contact with a light-sensitive substrate creates traces on that substrate (for example on a photoresist or on a photographic film). The light-emitting particle causes photochemical/photoelectric changes in the light-sensitive substrate, creating a latent image. A group of these particles can be used to write many features on the same substrate in a parallel manner. We investigate the use of electrokinetic forces to move the particles over the light-sensitive substrate. We also report on the use of high-aspect-ratio carbon MEMS (C-MEMS) electrodes as 3D dielectrophoretic traps for the light-emitting particles and investigate the feasibility of using these carbon electrodes to manipulate the light-emitting particles to trace sub-micron patterns on a light-sensitive surface. We propose two types of particle-based lithography schemes and discuss applicable scaling laws. Feasibility experiments were carried out using microscale devices.

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