A novel particle-based lithography is proposed. In this approach a particle moving in a liquid in contact with a light-sensitive
substrate creates traces on that substrate (for example on a photoresist or on a photographic film). The light-emitting particle causes photochemical/photoelectric changes in the light-sensitive substrate, creating a latent image. A
group of these particles can be used to write many features on the same substrate in a parallel manner. We investigate
the use of electrokinetic forces to move the particles over the light-sensitive substrate. We also report on the use of
high-aspect-ratio carbon MEMS (C-MEMS) electrodes as 3D dielectrophoretic traps for the light-emitting particles and
investigate the feasibility of using these carbon electrodes to manipulate the light-emitting particles to trace sub-micron
patterns on a light-sensitive surface. We propose two types of particle-based lithography schemes and discuss
applicable scaling laws. Feasibility experiments were carried out using microscale devices.