Mr. Rachit Gupta
at ASML Brion
SPIE Involvement:
Author
Publications (7)

SPIE Journal Paper | April 27, 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Metals, Critical dimension metrology, Overlay metrology, Optical lithography, Monochromatic aberrations, Optical proximity correction, Double patterning technology, Error analysis, Photomasks, Computational lithography

PROCEEDINGS ARTICLE | October 23, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Monochromatic aberrations, Optical lithography, Metals, Manufacturing, Photomasks, Double patterning technology, Computational lithography, Optical proximity correction, Critical dimension metrology, Overlay metrology

SPIE Journal Paper | September 11, 2015
JM3 Vol. 14 Issue 03
KEYWORDS: Dysprosium, Photomasks, Immersion lithography, Source mask optimization, Optical proximity correction, Printing, Optical lithography, Visualization, Lens design, Directed self assembly

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Optical lithography, Visualization, Transmission electron microscopy, Printing, Photomasks, Dysprosium, Directed self assembly, Source mask optimization, Optical proximity correction, Neodymium

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Etching, Metals, Error analysis, Manufacturing, Photomasks, Critical dimension metrology, Semiconducting wafers, Yield improvement, Overlay metrology, Model-based design

PROCEEDINGS ARTICLE | March 16, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Photovoltaics, Finite-difference time-domain method, Metals, 3D modeling, Printing, Image quality, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, SRAF

Showing 5 of 7 publications
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