Rachit Gupta
at ASML Silicon Valley
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 10 October 2019
Proc. SPIE. 10961, Optical Microlithography XXXII

Proceedings Article | 20 March 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Pattern recognition, Electroluminescence, Scanning electron microscopy, Printing, Photomasks, Source mask optimization, Optical proximity correction, SRAF, Semiconducting wafers

SPIE Journal Paper | 27 April 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Metals, Critical dimension metrology, Overlay metrology, Optical lithography, Monochromatic aberrations, Optical proximity correction, Double patterning technology, Error analysis, Photomasks, Computational lithography

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Monochromatic aberrations, Optical lithography, Metals, Manufacturing, Photomasks, Double patterning technology, Computational lithography, Optical proximity correction, Critical dimension metrology, Overlay metrology

SPIE Journal Paper | 11 September 2015
JM3 Vol. 14 Issue 03
KEYWORDS: Dysprosium, Photomasks, Immersion lithography, Source mask optimization, Optical proximity correction, Printing, Optical lithography, Visualization, Lens design, Directed self assembly

Showing 5 of 9 publications
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