Mr. Ragava Lokasani
Junior Researcher at Czech Technical Univ in Prague
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | May 17, 2017
Proc. SPIE. 10243, X-ray Lasers and Coherent X-ray Sources: Development and Applications
KEYWORDS: Nanostructures, Spectroscopy, Laser energy, Silicon, Plasmas, Laser applications, Nd:YAG lasers, Semiconductor lasers, Extreme ultraviolet, Extreme ultraviolet lithography, Pulsed laser operation, Plasma, Tin

PROCEEDINGS ARTICLE | May 14, 2015
Proc. SPIE. 9514, Laser Acceleration of Electrons, Protons, and Ions III; and Medical Applications of Laser-Generated Beams of Particles III
KEYWORDS: Lithography, X-rays, Ions, Plasmas, Extreme ultraviolet, Palladium, Picosecond phenomena, Molybdenum, Rhodium, Ruthenium

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Mirrors, Contamination, Photons, Electrons, Photoresist materials, Extreme ultraviolet, Beam shaping, Extreme ultraviolet lithography, Semiconducting wafers, EUV optics

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