Dr. Rainer Lebert
Senior Manager/EUV-XUV Solutions at RI Research Instruments GmbH
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Author
Publications (31)

PROCEEDINGS ARTICLE | October 12, 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Metrology, Scanners, Spectroscopy, Reflectivity, Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Reflectance spectroscopy, Chemical elements, Algorithm development

PROCEEDINGS ARTICLE | October 3, 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Reticles, Metrology, Reflection, Reflectivity, Reflectometry, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Spatial resolution

PROCEEDINGS ARTICLE | October 3, 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Lithography, Nanostructures, Optical filters, Metrology, Optical lithography, Pellicles, Photoresist materials, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | October 3, 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Light sources, Metrology, Lithium, Scanners, Super resolution microscopy, Extreme ultraviolet, Extreme ultraviolet lithography, Pulsed laser operation, Liquids, Tin

PROCEEDINGS ARTICLE | October 3, 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Thin films, Metrology, Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Lithography, Electron beam lithography, Modulation, Photoresist materials, Image quality, Photomasks, Extreme ultraviolet, Semiconducting wafers, Plasma, Phase shifts

Showing 5 of 31 publications
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