Dr. Rainer Leuschner
at Infineon Technologies AG
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 26 March 2008 Paper
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Semiconducting wafers, Coating, Polymers, Glasses, Optical alignment, Wafer manufacturing, Optical lithography, Temperature metrology, Epoxies, Silver

Proceedings Article | 1 June 1991 Paper
Proc. SPIE. 1466, Advances in Resist Technology and Processing VIII
KEYWORDS: Polymers, Semiconducting wafers, Deep ultraviolet, Photoresist processing, Etching, Lithography, Silicon, Plasma, Picture Archiving and Communication System, Oxygen

Proceedings Article | 1 June 1990 Paper
Proc. SPIE. 1262, Advances in Resist Technology and Processing VII
KEYWORDS: Picture Archiving and Communication System, Fourier transforms, Absorbance, Etching, Deep ultraviolet, Reactive ion etching, Lithography, Printing, Manganese, Molecules

Proceedings Article | 1 June 1990 Paper
Proc. SPIE. 1262, Advances in Resist Technology and Processing VII
KEYWORDS: Polymers, Silicon, Excimer lasers, Deep ultraviolet, Standards development, Lithography, Etching, Semiconducting wafers, Picture Archiving and Communication System, Ultraviolet radiation

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