Dr. Rainer Leuschner
at Infineon Technologies AG
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 26 March 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Optical lithography, Polymers, Glasses, Silver, Coating, Epoxies, Optical alignment, Semiconducting wafers, Wafer manufacturing, Temperature metrology

Proceedings Article | 1 June 1991
Proc. SPIE. 1466, Advances in Resist Technology and Processing VIII
KEYWORDS: Lithography, Deep ultraviolet, Etching, Polymers, Silicon, Oxygen, Photoresist processing, Semiconducting wafers, Plasma, Picture Archiving and Communication System

Proceedings Article | 1 June 1990
Proc. SPIE. 1262, Advances in Resist Technology and Processing VII
KEYWORDS: Lithography, Deep ultraviolet, Etching, Molecules, Fourier transforms, Printing, Absorbance, Manganese, Reactive ion etching, Picture Archiving and Communication System

Proceedings Article | 1 June 1990
Proc. SPIE. 1262, Advances in Resist Technology and Processing VII
KEYWORDS: Lithography, Deep ultraviolet, Etching, Polymers, Ultraviolet radiation, Silicon, Excimer lasers, Semiconducting wafers, Standards development, Picture Archiving and Communication System

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